Metrological Technologies Using Laser in Semiconductor Lithography.

Advanced Lithography: Nanoimprint Lithography for Semiconductor and Interconnect Technologies

Lithography Simulation in Semiconductor Manufacturing

In the 30 years since lithography modeling was first introduced, optical lithography simulation has progressed from a curiosity, to a research and development tool, and finally to a manufacturing tool. While much has been published on new developments in lithography simulators and their use in advanced lithography development, less is published on how simulators have been used and are soon to b...

Thick-film Lithography Using Laser Write

Major part of this work was carried out in Hsinchu. ABSTRACT Mask-making process using laser direct-write has been broadly applied in the microelectronics and the PC board industries. In this paper, we report the thick-film lithography of laser write mainly for the x-ray mask in the LIGA application. Several schemes of multiple writing are successfully demonstrated in terms of the sidewall stra...

dynamic analysis of semiconductor laser amplifier using transfer matrix method

transfer matrix method (tmm) has been applied to analyze characteristics of semiconductor laser optical amplifiers. the input signal is sinusoidal modulating wave and we do not assume the modulating bias signal as well. we have shown that the distoration arises from gain modulation at low modulation frequencies, but in microwave modulation frequencies, the gain takes an average value and the re...

Wavelength switching using multicavity semiconductor laser diodes

We demonstrate wavelength switching in a novel multicavity distributed Bragg reflector semiconductor laser diode. This new device, which uses an integrated saturable absorber and singlemode fiber Bragg gratings, digitally switches wavelength as a function of drive current between all possible binary combinations.